Characterizations Facilities
Seebeck coefficient/Electrical Resistance Measurement System:
Make: ADVANCE RIKO – Japan
Made: ZEM – 3M8
Mode: Pellets, Fabrics and Films
Specification:
- Working temperature: 30°C to 800°C
- Metals, alloys, ceramics, polymers, and thin films
- Helium atmosphere
This instrument is used to measure the Seebeck coefficient and the electrical resistivity of the materials. It operates by measuring the voltage generated when a temperature gradient is applied across a material.
Laser Flash Analyzer
Make: NETZSCH – Germany
Made: LFA – 467 HT Hyper Flash
Mode: Pellets
Specification:
- Quartz heater, Stainless Steel Cavity
- Working Temperature: 30˚C-900˚C
- Argon atmosphere
High-temperature laser flash analyzer used for measuring thermal diffusivity, thermal conductivity, and specific heat of materials at temperatures up to 900° C. It is a reliable and efficient instrument used in various industries for material testing and research purposes.
Spectrofluorometer
Make: JASCO-JAPAN
Made: FP-8350
Mode: Liquids, Pellets, Powders and Films
Specification:
- High sensitivity S/N 8,000:1 typical
- High resolution with SBW to 1.0 nm
- Wavelength range: 200 to 900nm
It is an extremely sensitive spectrofluorometer that can be used in the broadest range of applications. Many features like automatic cut-off filters eliminate peaks due to second-order scatter, giving more confidence in artifact-free spectral measurement.
UV-Vis Spectrophotometer with DRS System
Make: JASCO-JAPAN
Made: V-750
Specification:
- Spectral bandwidth set as narrow as 0.1 nm
- Measurements of solid and liquid samples in the UV and visible regions
Its optical design uses precision double-beam optics with variable spectral bandwidth. A high sensitivity PMT detector provides accurate and reproducible measurements for low to high concentration samples. By controlling the high voltage applied to the PMT, the dynode feedback offers a wider dynamic range than generally found on UV-Visible spectrophotometers.
Gas Sensing Measurement systems
Make: Hydro Pneo Vac Technologies
Mode: Dynamic/Static
Specification: Film
- Chamber Volume:1500cc/2500cc/3500cc
- Operating temperature:30˚C to 900˚C
- Resistance meter range from:0 to 100 T.Ohm
The interaction between the gas molecule and the sensor produces a variation in the resistance. The resistance of the sensor film was measured using Keithley 2636B System Source meter of the measurement range. Target gases and the carrier gas were interfaced to the chamber via MFC of flow rate :0-200 sccm. In addition, the VOC flask of volume: 125 mL equipped for VOC detection.
Fabrication Facilities
Two-Zone Tubular Furnace
Make: Nanotec – India
Made: Custom Made
Specification:
- Two independently controlled furnace zones
- Mass flow controlled for argon flow & atmosphere
- Working temperature: 30˚C to 1000 ˚C
In the process, Argon transports the vaporized solid precursor to a substrate for the deposition. The two-zone design allows for better control over temperature and pressure, leading to more precise and uniform deposition
Two-Zone Furnace for Chemical Vapor Transport Growth
Make: Nanotec-India
Made: Custom Made
Specification:
- Two independently controlled furnace zones
- Mass flow controlled for inert gas flow
- Working temperature:30˚C to 1000 ˚C
In this process, Inert gases transport the vaporized solid precursor to a substrate for the deposition. The two-zone design allows for better control over temperature and pressure, leading to more precise and uniform deposition.
Rapid Thermal Annealing (RTA) Furnace
Make: Nanotec-India
Made: Custom Made
Specification:
- Three independently controlled furnace zones
- Mass flow controller
- Working temperature:30˚C to 1000 ˚C
In the process, Argon transports the vaporized solid precursor to a substrate for the deposition. The two-zone design allows for better control over temperature and pressure, leading to more precise and uniform deposition.
Uniaxial Hydraulic Hot Press
Make: Vacuum Lab Technologies, Bengaluru, India
Made: Custom Made
Specification:
- Working Temperature:30 ˚C to 900 ˚C
- Chiller for fast cooling
- Vacuum atmosphere
The Uniaxial pressing method is a process of compacting powder into a rigid pellet by applying heat along with pressure in a uniaxial direction using a rigid punch.
Spray Pyrolysis
Make: HOLMARC – India
Made: HO-TH-04
Specification:
- Dispensing unit capacity & rate; 50 mL/250 mL & 1-10 mL/min
- Working temperature: 30 ˚C – 500 ˚C
Spray pyrolysis is a method for depositing thin films by spraying precursor solutions onto a heated substrate. As the solvent evaporates, it leaves behind a thin film of the desired material. This system is widely used in materials science, it offers simplicity, scalability, and the ability to create uniform coatings for various applications, including semiconductors and thin-film solar cells.
Spin Coating
Make: Navson, India.
A spin coater rapidly spins flat substrates while dispensing liquid solutions, creating uniform thin films crucial for semiconductor manufacturing and thin film research.
Hydraulic Press
Make: Technoresearch Industries, India
Made: M-15
A hydraulic pellet press compacts powdered materials into solid pellets using hydraulic pressure commonly employed in material science for sample preparation and analysis.
Synthesis Facilities
Ball Milling
Make: FRITSCH, Germany
Made: PULVERISETTE 7 – Premium Line
Specification:
- Centrifugal acceleration up to 95 g and up to 1100 rpm
- Extremely fast bowl changing due to self-lock
- Highest process reliability and precise reproducibility
The 2 grinding stations are designed for a broad range of applications and are ideally suited for loss-free grinding down to a final fineness of 100 nm of hard and brittle materials. Depending on the desired final fineness, the grinding can be performed dry, in suspension, or in inert gas.
Vacuum Sealing Unit
Make: Vacuum Lab Technologies, Bengaluru
Made: Custom Made
Specification:
- 10-6bar vacuum with rotary and diffusion pump
- Precise vacuum gauge (Pirani and Penning)
This instrument is designed to seal samples in quartz ampoules under high vacuum and is essential for preparing samples in a controlled environment, ensuring the integrity of the materials. Equipped with a unique vacuum valve to prevent material contamination
High Temperature Furnaces
This instrument is designed with materials that can withstand extreme heat and can be operated for precise temperature control. The temperature ranges from 30 ˚C to 1200 ˚C. It is used for processes such as annealing, sintering, and calcination.
Tubular furnace
Tubular furnaces are specialized electric heating devices designed for synthesizing and purifying inorganic and organic compounds under controlled atmospheres. They feature a cylindrical chamber surrounded by heating coils, allowing for precise temperature control and uniform heating, making them ideal for various thermal processes such as annealing, drying, and material synthesis.
Muffle Furnaces
A muffle furnace is a high-temperature heating device designed to isolate materials from combustion byproducts, typically operating at temperatures up to 600°C. It is widely used in laboratories and industries for applications such as ashing samples, heat treatment, and sintering materials, providing a controlled environment for precise thermal processing.
